
The ECD8 combines flexibility, safety, and ease of use in one compact system for substrates up to 200 mm. Available as coater or developer with customizable configurations, the system is the ideal choice for both R&D and small-scale production.
Effortless control
Experience the ECD8’s smart design: from effortless wafer centering to full process visibility, every detail is tailored to simplify workflows, save space, and keep operators safe in daily operation.
Consistent, high-quality results
The ECD8 provides precise control for a wide range of processes. High spin speeds, powerful acceleration, programmable recipes, and support for resists up to 4,000 cp ensure reproducible results you can rely on.