RCD8 Semi-Automated Coater & Developer

The RCD8 platform provides precise coating and developing for wafers up to 200 mm. Designed for R&D and small-scale production, it combines stable process control with reproducible results. High-quality components ensure industrial reliability, while exchangeable substrate chucks allow the processing of different wafer materials and geometries.​​ 

Industrial precision for flexible application

P​roven production technology combined with a modular architecture for flexible process configuration.The ​RCD8​´s ​​compatible platform architecture enables seamless upgrades, integrations, and process transfer to high-volume systems, ​​making​​ it ideally suited for laboratories, research facilities, and pilot lines​​​​​​ ​– ​all in a small, ergonomic footprint.

Precise processes, ​reproducible​​​ results

​​With precise spin-speed, acceleration control, and a robust dispensing system supporting viscosities up to 55,000 cps, the RCD8 delivers consistent coating and developing performance. The system can also be adapted to individual production needs with optional extensions, making it suitable for a wide range of materials and applications.