LabSpin Series Spin Coater & Developer         

Flexible, precise, and safe: The LabSpin6 and LabSpin8 represent the latest generation of manual spin coater and developer systems for wafers up to 150 and 200 mm. Engineered specifically for laboratory and R&D environments, the LabSpin series delivers uniform, repeatable results for a wide variety of photolithographic chemicals in a compact footprint. 

One system for countless possibilities

​​​​From quick prototyping to advanced process development, the LabSpin6 and LabSpin8 adapt seamlessly to your needs. Configure wafer size, chuck, coating options, and additional modules as your R&D evolves. With their compact design and intelligent technology, both systems take up little space and deliver precise, repeatable results.

Control your processes, accelerate your research

The LabSpin series is built for control at every step. With programmable recipes, adjustable spin speeds, and precise acceleration, you can fine-tune processes and reproduce them reliably for consistent, meaningful R&D results.