MA12 Gen3 Mask Aligner

The MA12 Gen3 is a semi-automated mask aligner for wafers up to 300mm, combining proven lithography with advanced imprint processing. It delivers cost-efficient exposure, high overlay accuracy, and ​process​​​ flexibility for MEMS, advanced packaging, and R&D. 

Flexible lithography meets effortless operation

​​​The MA12 Gen3 offers versatile lithography capabilities designed to support industrial R&D as well as mid- to large-scale production environments.​​​​ Its compact design saves cleanroom space while intuitive handling simplifies operation. Featuring SUSS’s latest technology, the mask aligner ensures stable, high-quality results ​and​​ ​improved imprint processing features for standard, advanced and high-end processes.​​

The MA12 Gen3 maximizes yield and ensures reproducible results even under challenging conditions. From enhanced leveling and MO Exposure Optics to specialized handling for warped wafers and sensitive materials, every feature is engineered for reliability and performance.