MA/BA Gen4 Serie Mask- and Bond Aligner

MA/BA Gen4 Series Mask and Bond Aligner

The MA/BA Gen4 series ​represents two platforms for ​​​semi-automated mask aligner and imprint ​processing for both standard or high-end applications​. Combining proven SUSS lithography technology with new automation and ergonomic features, ​the system​​ ensures stable performance, enhanced safety, and user-friendly operation for research, pilot production, and demanding process environments.

Your Benefits

​​Designed for intuitive operation and ergonomic ease, the MA/BA Gen4 reduces operator effort and ensures process consistency across MEMS, packaging, and imprint applications​​​​

Equipped with MO Exposure Optics^® and SUSS latest imprint technologies, the MA/BA Gen4 series delivers optical excellence, precision alignment, and superior resolution. Its modular design supports advanced packaging, MEMS/NEMS, 3D integration, compound semiconductors, LED, micro-optics, AR, and optoelectronics.